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International Biennial Print Exhibit: 2020 R.O.C.

International Biennial Print Exhibit: 2020 R.O.C.
中華民國第十九屆國際版畫雙年展

Merit Prize

Title of Work:Personal Scar I

Poland

Marcin HAJEWSKI

  • Name of Entrant:Marcin HAJEWSKI
  • Title of Work:Personal Scar I
  • Nationality:Poland
  • Artist Statement:
    As an artist who identifies himself for over a decade with the technique of lithography, I consider last 15 years as a process of searching my own artistic language and craftsmanship.

    As an assistant professor in my alma mater, I have had the privilege to analyse not only my own art problems, but also those of young artists. For several years I have been leading a research project dedicated to different printing techniques: lithography, algraphy and offset.

    My works from the past few years deal with personal memory. I am fascinated by how the human mind chooses to hide away certain experiences in life, most often experiences with a negative tinge. As a result I am able to bring events back from memory, revealing and defining the whole cycle of life as presented in Personal Scar.
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